Title :
Process development of electron beam lithography in an academic environment
Author :
Gatlin, Gregory S. ; Eskridge, Cory W. ; Brinkerhoff, Jacob M. ; Fife, Jared D. ; Jessing, Jeffrey R.
Author_Institution :
Boise State Univ., ID, USA
Abstract :
This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University´s (BSU) Idaho Microfabrication Laboratory (IML).
Keywords :
electron beam lithography; laboratories; laboratory techniques; academic environment; electron beam lithography; leading edge capabilities; numerical aperture; process development; random patterns; scanning electron microscope; serial patterning; university laboratory; Coatings; Electron beams; Electron optics; Laboratories; Lithography; Optical sensors; Optical surface waves; Production; Resists; Scanning electron microscopy;
Conference_Titel :
Microelectronics and Electron Devices, 2004 IEEE Workshop on
Print_ISBN :
0-7803-8369-9
DOI :
10.1109/WMED.2004.1297370
