DocumentCode
2965023
Title
Chip to wafer temporary bonding with self-alignment by patterned FDTS layer for size-free MEMS integration
Author
Lu, Jian ; Takagi, Hideki ; Maeda, Ryutaro
Author_Institution
Res. Center for Ubiquitous MEMS & Micro Eng. (UMEMSME), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear
2011
fDate
28-31 Oct. 2011
Firstpage
1121
Lastpage
1124
Abstract
In this paper, we present a low-cost and rapid self-alignment process for temporary bonding of MEMS chip onto carrier wafer for size-free MEMS-IC integration. For the first time, a hydrophobic self-assembled monolayer (SAM), FDTS (CF3(CF2)7(CH2)2SiCl3), was successfully patterned by lift-off process on an oxidized silicon carrier wafer. Small volume of H2O (~μl/cm2) was then dropped and spread on the non-coated hydrophilic SiO2 surface for temporary bonding of MEMS chip. Our results demonstrated that the hydrophobic FDTS pattern on carrier wafer enables rapid and precise self-alignment of MEMS chip onto SiO2 binding-site by capillary force. After transfer the MEMS chips to target wafer, FDTS can be removed by O2 plasma treatment or UV irradiation.
Keywords
elemental semiconductors; micromechanical devices; silicon; wafer bonding; FDTS layer; MEMS-IC integration; SAM; SiO2; UV irradiation; carrier wafer; chip to wafer temporary bonding; hydrophobic self-assembled monolayer; lift-off process; non-coated hydrophilic surface; plasma treatment; Bonding; Coatings; Force; Micromechanical devices; Surface morphology; Surface treatment; Wireless sensor networks;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2011 IEEE
Conference_Location
Limerick
ISSN
1930-0395
Print_ISBN
978-1-4244-9290-9
Type
conf
DOI
10.1109/ICSENS.2011.6126924
Filename
6126924
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