• DocumentCode
    2965023
  • Title

    Chip to wafer temporary bonding with self-alignment by patterned FDTS layer for size-free MEMS integration

  • Author

    Lu, Jian ; Takagi, Hideki ; Maeda, Ryutaro

  • Author_Institution
    Res. Center for Ubiquitous MEMS & Micro Eng. (UMEMSME), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
  • fYear
    2011
  • fDate
    28-31 Oct. 2011
  • Firstpage
    1121
  • Lastpage
    1124
  • Abstract
    In this paper, we present a low-cost and rapid self-alignment process for temporary bonding of MEMS chip onto carrier wafer for size-free MEMS-IC integration. For the first time, a hydrophobic self-assembled monolayer (SAM), FDTS (CF3(CF2)7(CH2)2SiCl3), was successfully patterned by lift-off process on an oxidized silicon carrier wafer. Small volume of H2O (~μl/cm2) was then dropped and spread on the non-coated hydrophilic SiO2 surface for temporary bonding of MEMS chip. Our results demonstrated that the hydrophobic FDTS pattern on carrier wafer enables rapid and precise self-alignment of MEMS chip onto SiO2 binding-site by capillary force. After transfer the MEMS chips to target wafer, FDTS can be removed by O2 plasma treatment or UV irradiation.
  • Keywords
    elemental semiconductors; micromechanical devices; silicon; wafer bonding; FDTS layer; MEMS-IC integration; SAM; SiO2; UV irradiation; carrier wafer; chip to wafer temporary bonding; hydrophobic self-assembled monolayer; lift-off process; non-coated hydrophilic surface; plasma treatment; Bonding; Coatings; Force; Micromechanical devices; Surface morphology; Surface treatment; Wireless sensor networks;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2011 IEEE
  • Conference_Location
    Limerick
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-9290-9
  • Type

    conf

  • DOI
    10.1109/ICSENS.2011.6126924
  • Filename
    6126924