DocumentCode :
2965550
Title :
Relative effects of adatom diffusion and direct impingement on InP nanowires grown via MOCVD
Author :
Moewe, Michael ; Chuang, Linus C. ; Dubrovskii, Vladimir ; Chang-Hasnain, Connie
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA
fYear :
2008
fDate :
2-15 Aug. 2008
Firstpage :
135
Lastpage :
136
Abstract :
We compare InP nanowires grown by MOCVD with a growth rate model which includes both direct precursor impingement and sidewall diffusion effects. The nanowires growth is limited by direct impingement and the Gibbs-Thomson effect.
Keywords :
III-V semiconductors; MOCVD; diffusion; indium compounds; semiconductor growth; semiconductor quantum wires; Gibbs-Thomson effect; InP; MOCVD; adatom diffusion; direct impingement; growth rate model; nanowires; sidewall diffusion; Chemicals; Equations; Gold; III-V semiconductor materials; Indium phosphide; MOCVD; Molecular beam epitaxial growth; Nanowires; Physics computing; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location :
Shonan Village
Print_ISBN :
978-1-4244-2656-0
Type :
conf
DOI :
10.1109/INOW.2008.4634482
Filename :
4634482
Link To Document :
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