Title :
Photonic crystal light-emitting diode fabricated with photoelectrochemical wet etching and phase mask interference
Author :
Lin, Cheng-Hung ; Chen, Cheng-Yen ; Yeh, Dong-Ming ; Yang, C.C.
Author_Institution :
Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei
Abstract :
We demonstrate the high light-extraction efficiency by using the photoelectrochemical etching technique for forming photonic crystal structures on an InGaN/GaN quantum-well light-emitting diode through phase-mask interference. More than 90% increase of output power is observed.
Keywords :
III-V semiconductors; etching; gallium compounds; indium compounds; light emitting diodes; masks; photoelectrochemistry; photonic crystals; semiconductor quantum wells; wide band gap semiconductors; InGaN-GaN; phase mask interference; phase-mask interference; photoelectrochemical wet etching; photonic crystal light-emitting diode; photonic crystal structures; quantum-well light-emitting diode; Diffraction; Gallium nitride; Gratings; Interference; Light emitting diodes; Optical scattering; Photonic crystals; Rough surfaces; Surface roughness; Wet etching;
Conference_Titel :
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location :
Shonan Village
Print_ISBN :
978-1-4244-2656-0
DOI :
10.1109/INOW.2008.4634533
