Title :
Fabrication of silicon mold for thermal Nanoimprint Lithography
Author :
Matsui, J. ; Takahashi, H. ; Xie, N. ; Mizuno, J. ; Utaka, K.
Author_Institution :
Grad. Sch. of Adv. Sci. & Eng., Waseda Univ., Tokyo
Abstract :
We fabricated a silicon mold for thermal Nanoimprint Lithography (NIL) with EB exposure and Deep-RIE. As a result, we obtained that including a grating whose pitch was 230nm with low roughness.
Keywords :
diffraction gratings; electron beam applications; elemental semiconductors; moulding; nanolithography; semiconductor growth; silicon; sputter etching; Si; deep reactive ion etching; electron beam exposure; grating; pitch; roughness; silicon mold; thermal nanoimprint lithography; Etching; Fabrication; Gratings; Lithography; Nanolithography; Resists; Silicon; Switches; Thermal engineering; Wavelength division multiplexing;
Conference_Titel :
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location :
Shonan Village
Print_ISBN :
978-1-4244-2656-0
DOI :
10.1109/INOW.2008.4634540
