Title :
Possibility of high index anisotropy in smartcut SOI Wafer for micro-photonic devices
Author :
Hirahara, D. ; Baba, T.
Author_Institution :
Dept. of Electr. & Comput. Eng., Yokohama Nat. Univ., Yokohama
Abstract :
We evaluated a large birefringence of 0.85 in a SOI layer by totally analyzing the measured index and theoretical and experimental dispersion characteristics of Si photonic wires. It was applied to an ultracompact polarization-insensitive AWG.
Keywords :
arrayed waveguide gratings; birefringence; elemental semiconductors; micro-optics; refractive index; silicon; silicon-on-insulator; wires; Si; birefringence; dispersion characteristics; high index anisotropy; microphotonic devices; photonic wires; smartcut SOI wafer; ultracompact polarization-insensitive AWG; Anisotropic magnetoresistance; Arrayed waveguide gratings; Birefringence; Dispersion; Ellipsoids; Optical polarization; Optical refraction; Optical variables control; Optical waveguide theory; Optical waveguides;
Conference_Titel :
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location :
Shonan Village
Print_ISBN :
978-1-4244-2656-0
DOI :
10.1109/INOW.2008.4634542
