DocumentCode
2966528
Title
Possibility of high index anisotropy in smartcut SOI Wafer for micro-photonic devices
Author
Hirahara, D. ; Baba, T.
Author_Institution
Dept. of Electr. & Comput. Eng., Yokohama Nat. Univ., Yokohama
fYear
2008
fDate
2-15 Aug. 2008
Firstpage
275
Lastpage
276
Abstract
We evaluated a large birefringence of 0.85 in a SOI layer by totally analyzing the measured index and theoretical and experimental dispersion characteristics of Si photonic wires. It was applied to an ultracompact polarization-insensitive AWG.
Keywords
arrayed waveguide gratings; birefringence; elemental semiconductors; micro-optics; refractive index; silicon; silicon-on-insulator; wires; Si; birefringence; dispersion characteristics; high index anisotropy; microphotonic devices; photonic wires; smartcut SOI wafer; ultracompact polarization-insensitive AWG; Anisotropic magnetoresistance; Arrayed waveguide gratings; Birefringence; Dispersion; Ellipsoids; Optical polarization; Optical refraction; Optical variables control; Optical waveguide theory; Optical waveguides;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
Conference_Location
Shonan Village
Print_ISBN
978-1-4244-2656-0
Type
conf
DOI
10.1109/INOW.2008.4634542
Filename
4634542
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