RF plasma processing for removal of contaminants in a high voltage anode-cathode gap

Author

Rintamaki, J.I. ; Gilgenbach, Ronald M. ; Hochman, J.M. ; Jaynes, R.L. ; Lash, J.S. ; Cohen, W.E. ; Menge, P.R. ; Cuneo, M.E.

Author_Institution

Dept. of Nucl. Eng. & Radiol. Sci., Michigan Univ., Ann Arbor, MI, USA

fYear

1996

fDate

3-5 June 1996

Firstpage

131

Abstract

Summary form only given, as follows. Experiments at Sandia National Lab have shown the importance of removing contaminants from ion diodes to reduce parasitic losses. At Michigan, experiments are underway to study the technique of RF plasma processing as a means of cleaning contaminants from the anode and cathode in the MELBA high voltage diode (-0.8 MV, 10 kA, 1 /spl mu/s). Diagnostics of the 13.56 MHz RF plasma (typically 90% Ar+10% O/sub 2/) include optical spectroscopy with pre-analysis and post-analysis of contaminants (e.g., CO, CO/sub 2/, H/sub 2/O) by means of a residual gas analyzer. Planned experiments will employ optical and laser diagnostics to investigate the effects of cleaning on electron-stimulated desorption of neutral and ion contaminants during high voltage diode pulses.

Keywords

plasma applications; -0.8 MV; 10 kA; 13.56 MHz; MELBA high voltage diode; RF plasma processing; contaminants removal; electron-stimulated desorption; high voltage anode-cathode gap; ion contaminants; ion diodes; laser diagnostics; neutral contaminants; optical diagnostics; optical spectroscopy; parasitic losses; Anodes; Cathodes; Cleaning; Diodes; Particle beam optics; Plasma diagnostics; Plasma materials processing; Radio frequency; Spectroscopy; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on

Conference_Location

Boston, MA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3322-5

Type

conf

DOI

10.1109/PLASMA.1996.550624

Filename

550624