Title :
A High-Gain, Two-Stage, X-Band SiGe Power Amplifier
Author :
Andrews, Joel ; Cressler, John D. ; Mitchell, Mark
Author_Institution :
Georgia Inst. of Technol., Atlanta
Abstract :
SiGe technology is becoming well-known for its capabilities as a high-speed IC design platform, and is being increasingly employed to address a wide variety of communications circuit applications. Unfortunately, the ever-increasing speed of the requisite SiGe transistors comes at a cost that significantly constrains their use in power amplifier design: available breakdown voltage. We demonstrate here that by using an optimized cascode amplifier architecture employing both the high speed (low breakdown voltage) and high breakdown voltage (low speed) SiGe transistors, one can relax these design constraints considerably. Using this approach, a two stage, X-Band amplifier has been fabricated exhibiting maximums of more than 40 dB of stable gain, an output power greater than 20 dBm, and a power-added efficiency of 25% over the X-band operating frequency of 8.5 to 10.5 GHz, and is suitable for emerging X-band phased array radar applications.
Keywords :
Ge-Si alloys; MMIC power amplifiers; bipolar MMIC; IC design; SiGe; X-band power amplifier; communications circuit applications; frequency 8.5 GHz to 10.5 GHz; high breakdown voltage transistors; low breakdown voltage transistors; optimized cascode amplifier architecture; phased array radar applications; power-added efficiency; two stage amplifier; Application specific integrated circuits; Constraint optimization; Costs; Design optimization; Germanium silicon alloys; High power amplifiers; High speed integrated circuits; Phased arrays; Power amplifiers; Silicon germanium; SiGe; power amplifiers;
Conference_Titel :
Microwave Symposium, 2007. IEEE/MTT-S International
Conference_Location :
Honolulu, HI
Print_ISBN :
1-4244-0688-9
Electronic_ISBN :
0149-645X
DOI :
10.1109/MWSYM.2007.380084