Title :
Oxygen sensing with ZnO thin films
Author :
Blauw, M.A. ; Dam, V.A.T. ; Crego-Calama, M. ; Brongersma, S.H. ; Musschoot, J. ; Detavernier, C.
Author_Institution :
Holst Centre, imec, Eindhoven, Netherlands
Abstract :
ZnO thin films for O2 sensing were obtained with atomic layer deposition (ALD) and treated with rapid thermal annealing (RTA). The response of the ZnO conductivity to O2 exposure is reversible at 270°C. The sensitivity and responsivity are increased in comparison with O2 sensing at 500°C that was reported in literature. It is assumed that the improved O2 sensing characteristics are due to the increased surface-to-volume ratio of the film. The responsivity that is defined as the inverse of response time also improved because of the decreased bulk diffusion length. The application of ZnO thin films that are obtained by ALD to O2 sensing thus results in reduced power consumption while improving the O2 sensing characteristics.
Keywords :
atomic layer deposition; gas sensors; oxygen; power consumption; rapid thermal annealing; thin films; zinc compounds; ALD; O; RTA; ZnO; atomic layer deposition; conductivity; gas sensor; power consumption; rapid thermal annealing; thin films; Conductivity; Films; Plasma temperature; Temperature measurement; Temperature sensors; Zinc oxide;
Conference_Titel :
Sensors, 2011 IEEE
Conference_Location :
Limerick
Print_ISBN :
978-1-4244-9290-9
DOI :
10.1109/ICSENS.2011.6127128