Features of the channel formation during the voltage generator with the 1-MV/ns-voltage-rise-rate discharge to the coaxial line containing either closed via microconductor or open-ended gap

The features of plasma generation and plasma channels structure formation during the high-voltage pulse, with rise rate of about 1 MV/ns, propagating along the micron-diameter conductors are experimentally investigated. The role of the electrodynamic processes, taking place within the surface layer of microconductors and their vicinity, in plasma channels space-time structure formation is revealed. It is shown that plasma channel consists of the dense core, plasma crown and current-carrying layer in between.