Title :
41-Channel arrayed waveguide grating multiplexer using UV curable polymer operating around 1550nm
Author :
Zhang, D.M. ; Chen, C.M. ; Zhang, H.M. ; Zhang, X.Z. ; Zhang, D. ; Mu, S.K. ; Zhang, X.L. ; Li, L. ; Song, J.F.
Author_Institution :
Jilin Univ., Changchun
Abstract :
In this paper, a polymeric 41-channel AWG multiplexer was fabricated by simple direct ultraviolet photolithography process. We try to use a cross-linkable negative photoresist as core material and an optically clear UV curable epoxy as cladding material. Once exposed to ultraviolet light through a photomask, the polymeric waveguide stripes were obtained upon development. The propagation loss is low as 2.03 dB/cm at 1550 nm wavelength. The AWG multiplexer has channel spacing of 0.789 nm and the center wavelength is close to 1550 nm. The new technique will be well suited for fabricating optical integrated circuits (OICS).
Keywords :
arrayed waveguide gratings; cladding techniques; masks; ultraviolet lithography; 41-channel arrayed waveguide grating multiplexer; UV curable epoxy; UV curable polymer; cladding material; direct ultraviolet photolithography process; optical integrated circuits; photomask; polymeric waveguide stripes; Arrayed waveguide gratings; Channel spacing; Integrated optics; Lithography; Multiplexing; Optical materials; Optical polymers; Optical waveguides; Propagation losses; Resists; UV curable polymeric resist; arrayed waveguide grating; optical waveguide; wavelength division mutiplexing;
Conference_Titel :
Information, Communications & Signal Processing, 2007 6th International Conference on
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-0982-2
Electronic_ISBN :
978-1-4244-0983-9
DOI :
10.1109/ICICS.2007.4449546
