DocumentCode :
2972778
Title :
Demonstration of a Low Loss W-band Interconnect and Circuit Isolation Structure for Wafer Scale Assembly
Author :
Farkas, David S. ; Luna, Tony ; Chang-Chien, Patty P. ; Tornquist, Kelly ; Fordham, Owen ; Tsai, Roger
Author_Institution :
Northrop Grumman Corp., Redondo Beach
fYear :
2007
fDate :
3-8 June 2007
Firstpage :
1641
Lastpage :
1644
Abstract :
In this paper, we demonstrate wafer scale assembly (WSA) technology at W-band frequencies. This technology enables compact and high performance millimeter-wave modules to be manufactured using the high volume, batch fabrication processes that are currently used to produce MMIC´s. Key features of WSA are vertical, low loss interconnects that are fabricated with a high level of uniformity, and compact MMIC channelization through the use of isolation fences. In this paper, we demonstrate vertical WSA interconnects with less than 0.2 dB of insertion loss at W-band with high levels of uniformity. We also demonstrate a single isolation fence that provides 30 dB of isolation. This technology has the potential to vertically integrated several MMIC layers to form compact, multilayer millimeter-wave modules.
Keywords :
integrated circuit interconnections; microwave integrated circuits; millimetre wave integrated circuits; MIMIC; MMIC; circuit isolation structure; low loss w-band interconnect; wafer scale assembly; Assembly; Fabrication; Frequency; Insertion loss; Integrated circuit interconnections; Isolation technology; MMICs; Manufacturing processes; Millimeter wave circuits; Millimeter wave technology; Interconnections; MMICs; Millimeter Wave Circuits; Multichip Modules; Wafer Bonding; Wafer-scale Integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium, 2007. IEEE/MTT-S International
Conference_Location :
Honolulu, HI
ISSN :
0149-645X
Print_ISBN :
1-4244-0688-9
Electronic_ISBN :
0149-645X
Type :
conf
DOI :
10.1109/MWSYM.2007.380002
Filename :
4264163
Link To Document :
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