• DocumentCode
    2973050
  • Title

    Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

  • Author

    Zhao, M. ; Oigawa, H. ; Ji, J. ; Ueda, T.

  • Author_Institution
    Grad. Sch. of Inf., Production & Syst., Waseda Univ., Kitakyushu, Japan
  • fYear
    2011
  • fDate
    28-31 Oct. 2011
  • Firstpage
    1693
  • Lastpage
    1696
  • Abstract
    This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.
  • Keywords
    computerised instrumentation; etching; quartz; 2D anisotropic etching simulator; AT-plate quartz crystal; Z-plate quartz crystal; perforated etching; perforated etching shape; quartz wafer; Crystals; Databases; Semiconductor device modeling; Shape; Simulation; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Sensors, 2011 IEEE
  • Conference_Location
    Limerick
  • ISSN
    1930-0395
  • Print_ISBN
    978-1-4244-9290-9
  • Type

    conf

  • DOI
    10.1109/ICSENS.2011.6127322
  • Filename
    6127322
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2973050