Title :
Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer
Author :
Zhao, M. ; Oigawa, H. ; Ji, J. ; Ueda, T.
Author_Institution :
Grad. Sch. of Inf., Production & Syst., Waseda Univ., Kitakyushu, Japan
Abstract :
This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.
Keywords :
computerised instrumentation; etching; quartz; 2D anisotropic etching simulator; AT-plate quartz crystal; Z-plate quartz crystal; perforated etching; perforated etching shape; quartz wafer; Crystals; Databases; Semiconductor device modeling; Shape; Simulation; Wet etching;
Conference_Titel :
Sensors, 2011 IEEE
Conference_Location :
Limerick
Print_ISBN :
978-1-4244-9290-9
DOI :
10.1109/ICSENS.2011.6127322
