Temperature dependence of optical constants of silicon for short wavelength FIR laser lines

Author

Nakayama, K. ; Okajima, S. ; Ohkuma, H. ; Kawahata, K. ; Tanaka, K. ; Tokuzawa, T. ; Akiyama, T. ; Ito, Y.

Author_Institution

Coll. of Eng., Chubu Univ., Kasugai, Japan

Volume

2

fYear

2005

fDate

19-23 Sept. 2005

Firstpage

596

Abstract

Using far-infrared (FIR) lasers of 119, 71, 57, and 48 μm in wavelength, optical constants (refractive index and absorption coefficient) of a high resistive silicon at 10, 19, and 29°C have been measured in order to design a window and a beam splitter of a multi-channel measurement system such as fusion plasma diagnostics. The silicon has a resistivity of about 2.8 kΩ·cm. It has been found that the refractive index is sensitive for a change in the temperature. The window and the beam splitter at several temperatures have been designed.

Keywords

absorption coefficients; optical beam splitters; optical materials; refractive index; silicon; submillimetre wave lasers; thermal resistance; 10 C; 119 micron; 19 C; 29 C; 48 micron; 57 micron; 71 micron; Si; beam splitter design; fusion plasma diagnostics; multichannel measurement system; optical absorption coefficient; optical constants; refractive index; short wavelength FIR laser lines; temperature dependence; Finite impulse response filter; Optical refraction; Optical sensors; Optical variables control; Plasma measurements; Plasma temperature; Refractive index; Silicon; Temperature dependence; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves and 13th International Conference on Terahertz Electronics, 2005. IRMMW-THz 2005. The Joint 30th International Conference on

Print_ISBN

0-7803-9348-1

Type

conf

DOI

10.1109/ICIMW.2005.1572682

Filename

1572682