• DocumentCode
    2974658
  • Title

    Accurate micro Hall Effect measurements on scribe line pads

  • Author

    Osterberg, F.W. ; Petersen, D.H. ; Wang, F. ; Rosseel, E. ; Vandervorst, W. ; Hansen, O.

  • Author_Institution
    Dept. of Micro & Nanotechnol., Tech. Univ. of Denmark, Lyngby, Denmark
  • fYear
    2009
  • fDate
    Sept. 29 2009-Oct. 2 2009
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Hall mobility and sheet carrier density are important parameters to monitor in advanced semiconductor production. If micro Hall effect measurements are done on small pads in scribe lines, these parameters may be measured without using valuable test wafers. We report how Hall mobility can be extracted from micro four-point measurements performed on a rectangular pad. The dimension of the investigated pad is 400 × 430 ¿m2, and the probe pitches range from 20 ¿m to 50 ¿m. The Monte Carlo method is used to find the optimal way to perform the Hall measurement and extract Hall mobility most accurate in less than a minute. Measurements are performed on shallow trench isolation patterned silicon wafers to verify the results from the Monte Carlo method.
  • Keywords
    Hall mobility; Monte Carlo methods; carrier density; elemental semiconductors; isolation technology; silicon; Hall mobility; Monte Carlo method; Si; microHall effect measurements; microfour-point measurements; patterned silicon wafers; rectangular pad; scribe line pads; semiconductor production; shallow trench isolation; sheet carrier density; Charge carrier density; Current measurement; Electrical resistance measurement; Hall effect; Insulation; Magnetic field measurement; Performance evaluation; Probes; Testing; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Thermal Processing of Semiconductors, 2009. RTP '09. 17th International Conference on
  • Conference_Location
    Albany, NY
  • ISSN
    1944-0251
  • Print_ISBN
    978-1-4244-3814-3
  • Electronic_ISBN
    1944-0251
  • Type

    conf

  • DOI
    10.1109/RTP.2009.5373450
  • Filename
    5373450