DocumentCode :
2974941
Title :
Study of sub-melt laser damage annealing using Therma-Probe
Author :
Rosseel, Erik ; Bogdanowicz, Janusz ; Clarysse, Trudo ; Vandervorst, Wilfried ; Salnik, Alex ; Han, Sang-Hyun ; Nicolaides, Lena
Author_Institution :
IMEC, Leuven, Belgium
fYear :
2009
fDate :
Sept. 29 2009-Oct. 2 2009
Firstpage :
1
Lastpage :
4
Abstract :
In the present work we report on Therma-Probe (TP) measurements to quantify the residual lattice damage after sub-melt laser annealing for different Ge pre-amorphization implant (PAI) conditions. The calibration of the TP signal, the influence of different laser parameters and the relation to junction leakage is discussed.
Keywords :
Monte Carlo methods; amorphisation; calibration; crystal defects; dissolving; elemental semiconductors; germanium; ion implantation; laser beam annealing; laser beam effects; optical modulation; photoreflectance; reflectometry; Jk:Ge; Monte-Carlo simulations; calibration; defect dissolution degree; equivalent total defect densities; junction leakage; laser parameters; photo-modulated optical reflectance measurement; pre-amorphization implant conditions; residual defects; residual lattice damage; sub-melt laser annealing; therma-probe measurements; therma-wave measurement; Annealing; Implants; Interference; Laser beams; Laser excitation; Laser tuning; Lattices; Optical pumping; Plasma temperature; Reflectivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Thermal Processing of Semiconductors, 2009. RTP '09. 17th International Conference on
Conference_Location :
Albany, NY
ISSN :
1944-0251
Print_ISBN :
978-1-4244-3814-3
Electronic_ISBN :
1944-0251
Type :
conf
DOI :
10.1109/RTP.2009.5373464
Filename :
5373464
Link To Document :
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