DocumentCode :
2977333
Title :
3D Parallel Finite Element Monte Carlo Simulator With Quantum Corrections Using Density Gradient Approach
Author :
Aldegunde, Manuel ; Garcia-Loureiro, Antonio J. ; Seoane, Natalia ; Martinez, Antonio ; Kalna, Karol
Author_Institution :
Dept. de Electron. y Comput., Univ. de Santiago de Compostela, Santiago de Compostela
fYear :
2009
fDate :
11-13 Feb. 2009
Firstpage :
207
Lastpage :
210
Abstract :
Novel thin-body architectures with non-planar geometries are foreseen to replace bulk devices at the 18 nm gate length technology and beyond because they have a superior control of electrostatic and can deliver the 2008 ITRS prescribed on-current. We report on the development of a parallel 3D Monte Carlo simulator which uses unstructured tetrahedral elements to describe the geometry of these new architectures. We also describe an incorporation of quantum corrections using the density gradient method since the quantum confinement plays an important role. Finally, we present test simulations of a 10 nm gate length double gate MOSFET with a body thickness of 6 nm, presenting the approach to minimise the magnitude of self forces originating from the use of tetrahedral elements.
Keywords :
MOSFET; Monte Carlo methods; finite element analysis; quantum theory; semiconductor device testing; 3D parallel finite element Monte Carlo simulator; density gradient approach; double gate MOSFET; quantum confinement; quantum correction; size 10 nm; size 6 nm; unstructured tetrahedral element; Computational geometry; Computational modeling; Computer architecture; Concurrent computing; Finite element methods; Monte Carlo methods; Potential well; Quantum computing; Quantum mechanics; Solid modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location :
Santiago de Compostela
Print_ISBN :
978-1-4244-2838-0
Electronic_ISBN :
978-1-4244-2839-7
Type :
conf
DOI :
10.1109/SCED.2009.4800467
Filename :
4800467
Link To Document :
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