DocumentCode
2977997
Title
On the uniformity of an inductively coupled, cylindrical discharge of hydrogen
Author
Giuliani, J.L. ; Mulbrandon, M. ; Sethian, James ; Apruzese, J.P. ; Davis, J. ; Shamamian, V. ; Campbell, Rick ; Butler, J. ; Robson
Author_Institution
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear
1996
fDate
3-5 June 1996
Firstpage
156
Abstract
Summary form only given, as follows. In an RF inductively coupled discharge, the axial extent of the plasma is known to vary with the applied power, the oscillator frequency, and the neutral gas pressure. Applications of such plasmas to materials processing and lighting require a uniform plasma to optimize throughput efficiency and power coupling. To investigate these plasma phenomena, NRL has developed a cylindrical plasma chamber which is transformer coupled to a 13.6 MHz, 10 kW oscillator through a single turn copper strap. The double walled quartz chamber contains axial rods as a capacitive shield to ensure pure inductive coupling. The chamber, which was designed with optical access for plasma/chemistry diagnostics, will be described and initial experiments reported on. The research program also involves 2-D (r-z) numerical simulations of an H/sub 2/ plasma discharge at several Torr pressure. In the models the electromagnetic fields are solved self-consistently with the steady state gas dynamics. A plasma chemistry for the neutral and ionic species H, H/sub 2/, H/sup +/ and H/sub 3//sup +/, is included with multi-species diffusion for the neutral constituents and ambipolar diffusion for the charged components. Electron and neutral temperature equations account for the transfer of energy from the electrons to the neutrals, and finally to the walls. Predictions of the plasma uniformity, magnetic field strengths, and hydrogen Balmer emissions will be presented for various experimental parameters such as power, pressure, inner wall coating, as well as coupling circuit parameters. A simple expression for the axial plasma extent versus these quantities will be presented.
Keywords
high-frequency discharges; 10 kW; 13.6 MHz; 2D (r-z) numerical simulations; H; H Balmer emissions; H/sub 2/; H/sub 3//sup +/; H/sup +/; RF inductively coupled cylindrical discharge; ambipolar diffusion; axial rods; capacitive shield; double walled quartz chamber; electromagnetic fields; lighting; magnetic field strengths; materials processing; multi-species diffusion; neutral gas pressure; oscillator frequency; plasma chemistry; plasma uniformity; plasma/chemistry diagnostics; self-consistent theory; single turn Cu strap; steady state gas dynamics; temperature equations; Electrons; Oscillators; Plasma applications; Plasma chemistry; Plasma diagnostics; Plasma materials processing; Plasma simulation; Plasma temperature; Radio frequency; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.550683
Filename
550683
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