DocumentCode
2978027
Title
Recombination and diffusion processes in an ICP investigated by the power interruption technique
Author
De Regt, J.M. ; Jonkers, J. ; Van der Mullen, J.A.M.
Author_Institution
Dept. of Phys., Eindhoven Univ. of Technol., Netherlands
fYear
1996
fDate
3-5 June 1996
Firstpage
157
Abstract
Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.
Keywords
argon; Ar; ICP; diffusion; electron density; electron temperature; inductively coupled plasmas; light sources; power interruption technique; recombination; spectrochemical analysis; Argon; Diffusion processes; Electrons; Light sources; Optical coupling; Plasma density; Plasma properties; Plasma sources; Plasma temperature; Spontaneous emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.550685
Filename
550685
Link To Document