DocumentCode :
2978027
Title :
Recombination and diffusion processes in an ICP investigated by the power interruption technique
Author :
De Regt, J.M. ; Jonkers, J. ; Van der Mullen, J.A.M.
Author_Institution :
Dept. of Phys., Eindhoven Univ. of Technol., Netherlands
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
157
Abstract :
Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.
Keywords :
argon; Ar; ICP; diffusion; electron density; electron temperature; inductively coupled plasmas; light sources; power interruption technique; recombination; spectrochemical analysis; Argon; Diffusion processes; Electrons; Light sources; Optical coupling; Plasma density; Plasma properties; Plasma sources; Plasma temperature; Spontaneous emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.550685
Filename :
550685
Link To Document :
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