• DocumentCode
    2978329
  • Title

    Monte-Carlo method in AFM calibration

  • Author

    González-Jorge, H. ; Valencia, J.L. ; Alvarez, V. ; Rodríguez, F. ; Yebra, F.J.

  • Author_Institution
    LOMG, Ourense
  • fYear
    2009
  • fDate
    11-13 Feb. 2009
  • Firstpage
    432
  • Lastpage
    435
  • Abstract
    Surface measurements made using atomic force microscopy are one of the most important fields in quality control for the semiconductor industry. Uncertainty is typically estimated using complicated model functions and Monte-Carlo method appears very interesting for making these calculations easily and non-assuming the linearity of the functions. This procedure was checked by the calibration of transfer standards in lateral and vertical directions. Results show its capability for the calculation and are in agreement with the Central Limit Theorem for trials over 10.000.
  • Keywords
    Monte Carlo methods; atomic force microscopy; measurement uncertainty; quality control; semiconductor industry; surface topography measurement; AFM calibration; Central Limit Theorem; Monte-Carlo method; atomic force microscopy; quality control; semiconductor industry; surface measurement; uncertainty evaluation; Atomic force microscopy; Atomic measurements; Calibration; Electronics industry; Force measurement; Hysteresis; Instruments; Mathematical model; Quality control; Uncertainty;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices, 2009. CDE 2009. Spanish Conference on
  • Conference_Location
    Santiago de Compostela
  • Print_ISBN
    978-1-4244-2838-0
  • Electronic_ISBN
    978-1-4244-2839-7
  • Type

    conf

  • DOI
    10.1109/SCED.2009.4800526
  • Filename
    4800526