DocumentCode
2978329
Title
Monte-Carlo method in AFM calibration
Author
González-Jorge, H. ; Valencia, J.L. ; Alvarez, V. ; Rodríguez, F. ; Yebra, F.J.
Author_Institution
LOMG, Ourense
fYear
2009
fDate
11-13 Feb. 2009
Firstpage
432
Lastpage
435
Abstract
Surface measurements made using atomic force microscopy are one of the most important fields in quality control for the semiconductor industry. Uncertainty is typically estimated using complicated model functions and Monte-Carlo method appears very interesting for making these calculations easily and non-assuming the linearity of the functions. This procedure was checked by the calibration of transfer standards in lateral and vertical directions. Results show its capability for the calculation and are in agreement with the Central Limit Theorem for trials over 10.000.
Keywords
Monte Carlo methods; atomic force microscopy; measurement uncertainty; quality control; semiconductor industry; surface topography measurement; AFM calibration; Central Limit Theorem; Monte-Carlo method; atomic force microscopy; quality control; semiconductor industry; surface measurement; uncertainty evaluation; Atomic force microscopy; Atomic measurements; Calibration; Electronics industry; Force measurement; Hysteresis; Instruments; Mathematical model; Quality control; Uncertainty;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location
Santiago de Compostela
Print_ISBN
978-1-4244-2838-0
Electronic_ISBN
978-1-4244-2839-7
Type
conf
DOI
10.1109/SCED.2009.4800526
Filename
4800526
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