Title :
Real Time Probing of Self-Assembling Process Steps in InAs/GaAs Quantum Dot Growth
Author :
Kudo, Talkuya ; Inoue, Tomoya ; Kita, Takashi ; Wada, Osamu
Author_Institution :
Kobe Univ., Kobe
Abstract :
Self-assembling process of InAs/GaAs quantum dots (QDs) has been investigated by analyzing reflection high-energy electron diffraction (RHEED) images. During the island formation, the chevron diffraction of the RHEED shows dramatic changes depending on the As pressure. The self-assembling process has been found to consist of four steps. Initially islands are preferentially covered by high-index facets, which transform into low-index surfaces as the growth proceeds, and then the islands are covered by stable low-index facets. In this growth step, the island size becomes uniform, because of the self-limited growth. In the next step, we found indium flow back from the islands into the wetting layer, which causes shrinkage of the island size as well as formation of giant islands. This indium flow back can be controlled by As pressure.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; island structure; reflection high energy electron diffraction; self-assembly; semiconductor growth; semiconductor quantum dots; wetting; InAs-GaAs; RHEED; chevron diffraction; giant island formation; high-index facets; island size shrinkage; low-index surfaces; quantum dot growth; real time probing; reflection high-energy electron diffraction images; self-assembling process; self-limited growth; wetting layer; Diffraction; Electrons; Gallium arsenide; Indium; Molecular beam epitaxial growth; Optical reflection; Optical surface waves; Quantum dot lasers; Quantum dots; Size control;
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2007.381184