• DocumentCode
    2978430
  • Title

    Real Time Probing of Self-Assembling Process Steps in InAs/GaAs Quantum Dot Growth

  • Author

    Kudo, Talkuya ; Inoue, Tomoya ; Kita, Takashi ; Wada, Osamu

  • Author_Institution
    Kobe Univ., Kobe
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    303
  • Lastpage
    306
  • Abstract
    Self-assembling process of InAs/GaAs quantum dots (QDs) has been investigated by analyzing reflection high-energy electron diffraction (RHEED) images. During the island formation, the chevron diffraction of the RHEED shows dramatic changes depending on the As pressure. The self-assembling process has been found to consist of four steps. Initially islands are preferentially covered by high-index facets, which transform into low-index surfaces as the growth proceeds, and then the islands are covered by stable low-index facets. In this growth step, the island size becomes uniform, because of the self-limited growth. In the next step, we found indium flow back from the islands into the wetting layer, which causes shrinkage of the island size as well as formation of giant islands. This indium flow back can be controlled by As pressure.
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; island structure; reflection high energy electron diffraction; self-assembly; semiconductor growth; semiconductor quantum dots; wetting; InAs-GaAs; RHEED; chevron diffraction; giant island formation; high-index facets; island size shrinkage; low-index surfaces; quantum dot growth; real time probing; reflection high-energy electron diffraction images; self-assembling process; self-limited growth; wetting layer; Diffraction; Electrons; Gallium arsenide; Indium; Molecular beam epitaxial growth; Optical reflection; Optical surface waves; Quantum dot lasers; Quantum dots; Size control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381184
  • Filename
    4265941