DocumentCode :
2978448
Title :
Post-Annealing Effects on Emission Characteristics of InAs Quantum Dots on GaNAs Buffer Layer
Author :
Suzuki, R. ; Miyamoto, T. ; Koyama, F.
Author_Institution :
Tokyo Inst. of Technol., Yokohama
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
307
Lastpage :
310
Abstract :
Thermal annealing effects on PL characteristics of MOCVD grown InAs QD on GaNAs buffer layers were investigated. By using GaNAs buffer, the suppression of PL intensity degradation due to the crystalline improvement of GaNAs was observed.
Keywords :
III-V semiconductors; MOCVD; annealing; gallium compounds; indium compounds; photoluminescence; semiconductor quantum dots; GaNAs; InAs; MOCVD growth; thermal annealing effects; Buffer layers; Crystallization; Degradation; Gallium arsenide; Light sources; MOCVD; Quantum dots; Rapid thermal annealing; Temperature; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381185
Filename :
4265942
Link To Document :
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