DocumentCode :
2978540
Title :
Quinary TlGaInNAs DQW Structures: Effect of Growth Temperature and Growth Rate on Tl Incorporation
Author :
Krishnamurthy, D. ; Fujiwara, A. ; Hasegawa, S. ; Asahi, H.
Author_Institution :
Osaka Univ., Osaka
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
327
Lastpage :
330
Abstract :
TIGalnNAs-based DQW structures grown at various growth parameters were studied by secondary ion mass spectroscopy (SIMS). Enhanced Tl incorporation could be obtained using TlGaNAs barriers. A direct relationship between the Tl incorporation and N composition is clearly established by the analysis of the effect of growth temperature, growth rate, ECR power and nitrogen flow rate. The Tl incorporation increased with the increase of Tl flux in the case of DQW structures with TlGaAs barriers. In the case of DQW structures with TIGaNAs barriers, the Tl incorporation reached saturation at some Tl flux, indicating the N enhanced higher Tl incorporation.
Keywords :
secondary ion mass spectroscopy; semiconductor growth; semiconductor quantum wells; ternary semiconductors; thallium compounds; SIMS; Tl incorporation; TlGaNAs; TlGaNAs barriers; growth rate; growth temperature; quinary TIGalnNAs DQW structures; secondary ion mass spectroscopy; semiconductor quantum wells; Conference proceedings; Gallium arsenide; Indium phosphide; Light emitting diodes; Mass spectroscopy; Nitrogen; Sputtering; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381190
Filename :
4265947
Link To Document :
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