Title :
Sub-90 nm technologies-challenges and opportunities for CAD
Author :
Karnik, Tanay ; Borkar, Shekhar ; De, Vivek
Author_Institution :
Circuit Res., Intel Labs., Hillsboro, OR, USA
Abstract :
Future high performance microprocessor design with technology scaling beyond 90 nm will pose two major challenges: (1) energy and power, and (2) parameter variations. Design practice will have to change from deterministic design to probabilistic and statistical design. This paper discusses circuit techniques and design automation opportunities to overcome the challenges.
Keywords :
CMOS integrated circuits; VLSI; circuit CAD; integrated circuit design; microprocessor chips; nanoelectronics; 90 nm; CAD; CMOS scaling; EDA; circuit techniques; design automation; high performance microprocessor design; leakage power control; parameter variations; probabilistic design; statistical design; sub-90 nm technologies; technology scaling; CMOS technology; Circuits; Design automation; Energy efficiency; Frequency diversity; Logic; Microarchitecture; Microprocessors; Power generation; Threshold voltage;
Conference_Titel :
Computer Aided Design, 2002. ICCAD 2002. IEEE/ACM International Conference on
Print_ISBN :
0-7803-7607-2
DOI :
10.1109/ICCAD.2002.1167535
