• DocumentCode
    2980841
  • Title

    Extremely low-threshold continue-wave operation of InGaAs quantum-well lasers with an AlAs native-oxide layer grown by MOCVD

  • Author

    Su, Yan-Kuin ; Chang, Jen-Chieh ; Chen, Wei-Cheng ; Yu, Hsin-Chieh

  • Author_Institution
    Nat. Cheng Kung Univ., Tainan
  • fYear
    2007
  • fDate
    20-22 Dec. 2007
  • Firstpage
    221
  • Lastpage
    224
  • Abstract
    Threshold current as low as 12.8 mA for InGaAs quantum-well lasers grown by MOCVD have been demonstrated by a laterally oxidized technique. This value is relatively low for a wider active region (cavity length is 50 mum, stripe width is 14 mum) compare to other paper, thus indicates a lower threshold current density of 130 A/cm2. With an thin AlAs confinement layer above the active region, improvement of CW operation and no obvious degradation of lasing performance for oxide-confined laser have been observed in this work.
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; arsenic compounds; gallium compounds; indium compounds; quantum well lasers; AlAs; InGaAs; current 12.8 mA; low-threshold continue-wave operation; metalorganic chemical vapour deposition; native-oxide layer; oxide-confined laser; quantum well lasers; Degradation; Indium gallium arsenide; MOCVD; Oxidation; Quantum well lasers; Semiconductor lasers; Surface emitting lasers; Temperature sensors; Threshold current; Vertical cavity surface emitting lasers; InGaAs; MOCVD; Native oxide; quantum-well laser;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
  • Conference_Location
    Tainan
  • Print_ISBN
    978-1-4244-0637-1
  • Electronic_ISBN
    978-1-4244-0637-1
  • Type

    conf

  • DOI
    10.1109/EDSSC.2007.4450102
  • Filename
    4450102