DocumentCode
2980841
Title
Extremely low-threshold continue-wave operation of InGaAs quantum-well lasers with an AlAs native-oxide layer grown by MOCVD
Author
Su, Yan-Kuin ; Chang, Jen-Chieh ; Chen, Wei-Cheng ; Yu, Hsin-Chieh
Author_Institution
Nat. Cheng Kung Univ., Tainan
fYear
2007
fDate
20-22 Dec. 2007
Firstpage
221
Lastpage
224
Abstract
Threshold current as low as 12.8 mA for InGaAs quantum-well lasers grown by MOCVD have been demonstrated by a laterally oxidized technique. This value is relatively low for a wider active region (cavity length is 50 mum, stripe width is 14 mum) compare to other paper, thus indicates a lower threshold current density of 130 A/cm2. With an thin AlAs confinement layer above the active region, improvement of CW operation and no obvious degradation of lasing performance for oxide-confined laser have been observed in this work.
Keywords
III-V semiconductors; MOCVD; aluminium compounds; arsenic compounds; gallium compounds; indium compounds; quantum well lasers; AlAs; InGaAs; current 12.8 mA; low-threshold continue-wave operation; metalorganic chemical vapour deposition; native-oxide layer; oxide-confined laser; quantum well lasers; Degradation; Indium gallium arsenide; MOCVD; Oxidation; Quantum well lasers; Semiconductor lasers; Surface emitting lasers; Temperature sensors; Threshold current; Vertical cavity surface emitting lasers; InGaAs; MOCVD; Native oxide; quantum-well laser;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
Conference_Location
Tainan
Print_ISBN
978-1-4244-0637-1
Electronic_ISBN
978-1-4244-0637-1
Type
conf
DOI
10.1109/EDSSC.2007.4450102
Filename
4450102
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