DocumentCode :
2980980
Title :
Impact of Metal Dummy Fills on the Performance of CMOS Inductors
Author :
Nan, Lan ; Mouthaan, Koen ; Xiong, Yong-Zhong ; Shi, Jinglin ; Rustagi, Subash Chander ; Ooi, Ban-I Cong
Author_Institution :
Nat. Univ. of Singapore, Singapore
fYear :
2007
fDate :
20-22 Dec. 2007
Firstpage :
251
Lastpage :
254
Abstract :
To meet the metal density and uniformity requirement, metal dummy fills are inserted on all metallization layers in modern CMOS technologies. These metal dummy fills can have a detrimental effect on the performance of IC components. In this paper, the impact of metal dummy fills on the equivalent circuit and the performance of on-chip spiral inductors is presented based on experimental data. A simple closed-form formula is further provided to account for the effect of metal dummy fills to update the model for inductors in the conventional environment without metal dummy fills.
Keywords :
CMOS integrated circuits; inductors; CMOS inductors; CMOS technologies; metal density; metal dummy fills; metallization layers; onchip spiral inductors; CMOS technology; Frequency estimation; Inductance; Inductors; Integrated circuit modeling; Metallization; Radio frequency; Semiconductor device modeling; Silicon; Spirals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
Conference_Location :
Tainan
Print_ISBN :
978-1-4244-0637-1
Electronic_ISBN :
978-1-4244-0637-1
Type :
conf
DOI :
10.1109/EDSSC.2007.4450109
Filename :
4450109
Link To Document :
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