Title :
Analysis of Radiation Damage on a Monolithic CMOS-MEMS Printhead
Author :
Wang, Kuo-Jung ; Tseng, Fan-Chung ; Chen, Wei-Lin ; Shen, Guang-Ren ; Wang, Wai W. ; Lee, Kelvin
Author_Institution :
BenQ Corp., Taoyuan
Abstract :
The failure mechanism of a monolithic CMOS-MEMS printhead has been thoroughly investigated. The E-beam Au-evaporation process induced radiation damage on the CMOS driving circuitry has been identified as the root cause of the printhead failure. This E-beam induced radiation damage causes severe leakage on the CMOS devices as well as a shift of threshold voltage to result in malfunctioning of printhead control circuitry. Appropriate annealing process that helps to alleviate the radiation damaged on MEMS printhead device is also reported.
Keywords :
CMOS integrated circuits; annealing; laser beam effects; leakage currents; micromechanical devices; monolithic integrated circuits; Au-evaporation process induced radiation damage; CMOS devices; CMOS driving circuitry; annealing process; e-beam induced radiation damage; failure mechanism; monolithic CMOS-MEMS printhead; printhead control circuitry; printhead failure; threshold voltage; CMOS process; CMOS technology; Circuits; Fabrication; Failure analysis; Ink; Micromechanical devices; Printing; Resists; Threshold voltage;
Conference_Titel :
Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
Conference_Location :
Tainan
Print_ISBN :
978-1-4244-0637-1
Electronic_ISBN :
978-1-4244-0637-1
DOI :
10.1109/EDSSC.2007.4450120
