DocumentCode :
2981648
Title :
Electrostatic mechanisms responsible for device degradation in AlGaN/AlN/GaN HEMTs
Author :
Kalavagunta, A. ; Touboul, A. ; Shen, L. ; Schrimpf, R.D. ; Reed, R.A. ; Fleetwood, D.M. ; Jain, R.K. ; Mishra, U.K.
Author_Institution :
Dept. of Electr. Eng., Vanderbilt Univ., Nashville, TN, USA
fYear :
2007
fDate :
10-14 Sept. 2007
Firstpage :
1
Lastpage :
7
Abstract :
Displacement-damage induced degradation in AlGaN/AlN/GaN HEMTs with polarization charge induced 2DEGs is examined using simulations and experiments. Carrier removal in the unintentionally doped AlGaN layer changes the space charge in the structure and this changes the band bending. The band bending decreases the 2DEG density, which in turn reduces the drain current in the device. The effect of the defect energy levels on the 2DEG density is also studied. The interplay between carrier removal, mobility degradation, and the charged defects is analyzed and quantified.
Keywords :
aluminium compounds; gallium compounds; high electron mobility transistors; 2DEG density; AlGaN-AlN-GaN; HEMT; band bending; carrier removal; device degradation; electrostatic mechanisms; high electron mobility transistor; mobility degradation; polarization charge induced 2DEG; Aluminum gallium nitride; Degradation; Electron mobility; Electrostatics; Gallium nitride; HEMTs; MODFETs; Polarization; Protons; Scattering; GaN; deep level traps; displacement damage; high electron mobility transistor (HEMT); polarization charge; proton radiation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation and Its Effects on Components and Systems, 2007. RADECS 2007. 9th European Conference on
Conference_Location :
Deauville
ISSN :
0379-6566
Print_ISBN :
978-1-4244-1704-9
Type :
conf
DOI :
10.1109/RADECS.2007.5205538
Filename :
5205538
Link To Document :
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