DocumentCode :
2982033
Title :
High-Performance Carbon Nanotube Field-Effect Transistors Using Low-Energy Ion Implantation
Author :
Maehashi, Kenzo ; Nishiguchi, Kohei ; Ohno, Yasuhide ; Inoue, Koichi ; Yamamoto, Kazuhiro ; Matsumoto, Kazuhiko
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Ibaraki
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
15
Lastpage :
16
Abstract :
The authors have investigated the effect of channel doping by low-energy ion implantation in carbon nanotube field-effect transistors (CNTFETs) with passivation films. Single-walled carbon nanotubes (SWNTs) are promising candidates for fabricating nano-electronic applications due to ideal one-dimensional structures. In particular, CNTFETs using semiconducting SWNTs as a channel are expected for high-sensitive biosensors and gas sensors. However, it is necessary to reduce the contact and channel resistance to fabricate high-performance FETs. In this abstract, we have succeeded in improving transport properties of CNTFETs using low-energy ion implantation techniques.
Keywords :
carbon nanotubes; contact resistance; field effect transistors; ion implantation; passivation; semiconductor doping; C; channel doping; channel resistance; contact resistance; field-effect transistors; low-energy ion implantation; passivation films; single-walled carbon nanotubes; Biosensors; CNTFETs; Carbon nanotubes; Gas detectors; Immune system; Ion implantation; Passivation; Semiconductivity; Semiconductor device doping; Semiconductor films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800715
Filename :
4800715
Link To Document :
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