DocumentCode :
2982345
Title :
Molding of high aspect ratio ferroelectric microstructures
Author :
Mina, I.G. ; Bharadwaja, S.S.N. ; Raviprakash, J. ; Trolier-McKinstry, S. ; Saldanha, N. ; Mayer, T.
Author_Institution :
Mater. Sci. & Eng. Mater. Res. Inst., Penn State Univ., University Park, PA, USA
fYear :
2004
fDate :
23-27 Aug. 2004
Firstpage :
258
Lastpage :
261
Abstract :
Fabrication of high aspect ratio structures of complex perovskite materials using photoresist templates is reported in this work. Water based (Pb,Ba)TiO3 (PBT) and 2-methoxyethanol based PbZr0.52Ti0.48O3 (PZT) sol-gel precursor solutions were used to infiltrate prefabricated photoresist templates on various substrates. The solutions were deposited by vacuum infiltration assisted dip coating. Pyrolysis and the crystallization of the pillars were performed after removal of the gel layer formed on the surface of the mold. During crystallization process of photoresist was removed simultaneously. Various aspect ratio PZT and PBT structures were obtained.
Keywords :
barium compounds; crystal microstructure; crystallisation; dip coating; ferroelectric materials; lead compounds; moulding; photoresists; pyrolysis; sol-gel processing; vacuum deposition; zirconium compounds; (PbBa)TiO3; 2-methoxyethanol; PZT; PbZrO3TiO3; complex perovskite materials; crystallization; high aspect ratio ferroelectric microstructures; photoresist templates; pyrolysis; sol-gel precursor solutions; vacuum infiltration assisted dip coating; Crystalline materials; Crystallization; Dip coating; Ferroelectric materials; Lithography; Microstructure; Optical films; Photonic band gap; Photonic crystals; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 2004. ISAF-04. 2004 14th IEEE International Symposium on
ISSN :
1099-4734
Print_ISBN :
0-7803-8410-5
Type :
conf
DOI :
10.1109/ISAF.2004.1418385
Filename :
1418385
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2982345
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