DocumentCode :
2983236
Title :
The characteristics of chemical lift off method using metallic buffer layer and its application to the vertical light emitting diodes
Author :
Lee, S.W. ; Jun-Seok Ha ; Lee, Hyung Jong ; Lee, S.H. ; Goto, Tetsu ; Fujii, Kenichi ; Cho, M.W. ; Yao, Tingfeng
Author_Institution :
Center for Interdiscipl. Res., Tohoku Univ., Sendai
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
139
Lastpage :
140
Abstract :
The authors report the characteristics of chemical lift-off method using metallic buffer layer and its application to the real light emitting devices.
Keywords :
buffer layers; light emitting diodes; chemical lift off; metallic buffer layer; vertical light emitting diodes; Buffer layers; Chemical processes; Epitaxial growth; Etching; Gallium nitride; Lattices; Leakage current; Light emitting diodes; Substrates; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800773
Filename :
4800773
Link To Document :
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