Title : 
Ablation of metals by a channelspark electron beam
         
        
            Author : 
Gilgenbach, Ronald M. ; Kovaleski, Scott D. ; Ang, L.K. ; Lash, J.S. ; Spindler, H.L. ; Hochman, J.M. ; Jaynes, R.T. ; Cohen, W.E. ; Lau, Y.Y.
         
        
            Author_Institution : 
Dept. of Nucl. Eng. & Radiol. Scis., Michigan Univ., Ann Arbor, MI, USA
         
        
        
        
        
            Abstract : 
Summary form only given. A new experiment has been constructed for ablation of materials by a channelspark electron beam. This experiment has the goal of electron beam ablative deposition of thin films. The channelspark (pseudospark) generator obtained from Forschungszentrum Karlsruhe has operating parameters: V=15-20 kV, 1/spl les/1.5 kA, and pulselength of /spl sim/100 ns in a beam diameter of /spl les/2 mm. Initial experiments are concentrating on characterization of the channelspark electron beam generation at different pressures. Electron beam ablation of metals (Al and Fe) is being investigated by collected e-beam current measurements and optical diagnostics. Target analysis is compared between e-beam ablation and KrF laser ablation to elucidate the differences in the physical mechanisms. Electron beam energy deposition has been modeled by the ITS-TIGER code of Sandia National Labs. The electron beam energy deposition profile can be utilized to predict the temperature profile induced in the metal target.
         
        
            Keywords : 
electron beam applications; 1.5 kA; 100 ns; 15 to 20 kV; Al; Fe; ITS-TIGER code; KrF; KrF laser ablation; ablation; channelspark electron beam; electron beam ablative deposition; electron beam energy deposition; electron beam energy deposition profile; electron-beam ablation; metal target; metals; operating parameters; optical diagnostics; physical mechanisms; temperature profile; thin films; Character generation; Current measurement; Electron beams; Electron optics; Iron; Laser beams; Optical films; Optical pulse generation; Pulse generation; Sputtering;
         
        
        
        
            Conference_Titel : 
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
         
        
            Conference_Location : 
Boston, MA, USA
         
        
        
            Print_ISBN : 
0-7803-3322-5
         
        
        
            DOI : 
10.1109/PLASMA.1996.550722