• DocumentCode
    2983562
  • Title

    Ablation of metals by a channelspark electron beam

  • Author

    Gilgenbach, Ronald M. ; Kovaleski, Scott D. ; Ang, L.K. ; Lash, J.S. ; Spindler, H.L. ; Hochman, J.M. ; Jaynes, R.T. ; Cohen, W.E. ; Lau, Y.Y.

  • Author_Institution
    Dept. of Nucl. Eng. & Radiol. Scis., Michigan Univ., Ann Arbor, MI, USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    171
  • Abstract
    Summary form only given. A new experiment has been constructed for ablation of materials by a channelspark electron beam. This experiment has the goal of electron beam ablative deposition of thin films. The channelspark (pseudospark) generator obtained from Forschungszentrum Karlsruhe has operating parameters: V=15-20 kV, 1/spl les/1.5 kA, and pulselength of /spl sim/100 ns in a beam diameter of /spl les/2 mm. Initial experiments are concentrating on characterization of the channelspark electron beam generation at different pressures. Electron beam ablation of metals (Al and Fe) is being investigated by collected e-beam current measurements and optical diagnostics. Target analysis is compared between e-beam ablation and KrF laser ablation to elucidate the differences in the physical mechanisms. Electron beam energy deposition has been modeled by the ITS-TIGER code of Sandia National Labs. The electron beam energy deposition profile can be utilized to predict the temperature profile induced in the metal target.
  • Keywords
    electron beam applications; 1.5 kA; 100 ns; 15 to 20 kV; Al; Fe; ITS-TIGER code; KrF; KrF laser ablation; ablation; channelspark electron beam; electron beam ablative deposition; electron beam energy deposition; electron beam energy deposition profile; electron-beam ablation; metal target; metals; operating parameters; optical diagnostics; physical mechanisms; temperature profile; thin films; Character generation; Current measurement; Electron beams; Electron optics; Iron; Laser beams; Optical films; Optical pulse generation; Pulse generation; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550722
  • Filename
    550722