• DocumentCode
    2983669
  • Title

    Scaling properties of (111) InAs Nanowire MOSFETs

  • Author

    Lind, Erik ; Persson, Martin P. ; Thelander, Claes ; Niquet, Yann-Michel ; Samuelson, Lars ; Wernersson, Lars-Erik

  • Author_Institution
    Dept. of Solid State Phys., Lund Univ., Lund
  • fYear
    2008
  • fDate
    23-25 June 2008
  • Firstpage
    179
  • Lastpage
    180
  • Abstract
    Ill-V nanowire MOSFETs are currently under consideration for scaling beyond the 22 nm node. For a 50 nm diameter (111) InAs MOSFETs with a 50 nm long gate, we have shown a maximum transconductance of 0.8 S/mm and a drive current of 0.65 A/mm. We here investigate how the InAs MOSFET drive current behaves when the gate length is scaled down into the sub 10 nm regime. In order to achieve good control of the device electrostatics, the channel thickness (nanowire diameter) needs to be scaled as the gate length of the transistor is scaled. For a cylindrical nanowire gate geometry, simple modeling indicates that the wire diameter should be similar to the gate length. The wire diameter thus also needs to be scaled to the nm regime.
  • Keywords
    III-V semiconductors; MOSFET; electrostatics; indium compounds; nanowires; (111) InAs; InAs; channel thickness; cylindrical nanowire gate geometry; device electrostatics; maximum transconductance; nanowire MOSFET drive current; Dispersion; Geometry; MOSFETs; Parasitic capacitance; Physics; Quantum capacitance; Solid modeling; Solid state circuits; Transconductance; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2008
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-1942-5
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2008.4800792
  • Filename
    4800792