DocumentCode
2983669
Title
Scaling properties of (111) InAs Nanowire MOSFETs
Author
Lind, Erik ; Persson, Martin P. ; Thelander, Claes ; Niquet, Yann-Michel ; Samuelson, Lars ; Wernersson, Lars-Erik
Author_Institution
Dept. of Solid State Phys., Lund Univ., Lund
fYear
2008
fDate
23-25 June 2008
Firstpage
179
Lastpage
180
Abstract
Ill-V nanowire MOSFETs are currently under consideration for scaling beyond the 22 nm node. For a 50 nm diameter (111) InAs MOSFETs with a 50 nm long gate, we have shown a maximum transconductance of 0.8 S/mm and a drive current of 0.65 A/mm. We here investigate how the InAs MOSFET drive current behaves when the gate length is scaled down into the sub 10 nm regime. In order to achieve good control of the device electrostatics, the channel thickness (nanowire diameter) needs to be scaled as the gate length of the transistor is scaled. For a cylindrical nanowire gate geometry, simple modeling indicates that the wire diameter should be similar to the gate length. The wire diameter thus also needs to be scaled to the nm regime.
Keywords
III-V semiconductors; MOSFET; electrostatics; indium compounds; nanowires; (111) InAs; InAs; channel thickness; cylindrical nanowire gate geometry; device electrostatics; maximum transconductance; nanowire MOSFET drive current; Dispersion; Geometry; MOSFETs; Parasitic capacitance; Physics; Quantum capacitance; Solid modeling; Solid state circuits; Transconductance; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2008
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-4244-1942-5
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2008.4800792
Filename
4800792
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