Title :
Fabrication of a MEMS-Based Cobra Probe
Author :
Huang, Jung-Tang ; Hsu, Hou-Jun ; Chao, Pen-Shan ; Lee, Kuo-Yu ; Wu, Chan-Shoue ; Shih, Sheng-Hsiung ; Lin, Ming-Zhe ; Lee, Feng-Yue ; Lan, Zheng-Chang
Author_Institution :
Nat. Taipei Univ. of Technol., Taipei
Abstract :
This study presents a new type of cobra probe by using MEMS technology for IC testing. The fabrication includes photolithography, electroforming and polishing process. Mechanical properties of the cobra probe are measured and no fracture or deformation is found after applying a force of 3 g for as many as 20,000 times. Its contact resistance averages nearly 680 mOmega and overdrive is approximately up to 30 um.
Keywords :
contact resistance; electroforming; integrated circuit testing; micromechanical devices; photolithography; polishing; probes; IC testing; MEMS-based cobra probe; contact resistance; electroforming process; fabrication technology; photolithography process; polishing process; Contact resistance; Electrical resistance measurement; Fabrication; Force measurement; Integrated circuit testing; Lithography; Mechanical factors; Mechanical variables measurement; Micromechanical devices; Probes;
Conference_Titel :
Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
Conference_Location :
Tainan
Print_ISBN :
978-1-4244-0637-1
Electronic_ISBN :
978-1-4244-0637-1
DOI :
10.1109/EDSSC.2007.4450249
