DocumentCode :
2984752
Title :
High-Performance AlGaN/GaN HEMT-Compatible Lateral Field-Effect Rectifiers
Author :
Chen, Wanjun ; Huang, Wei ; Wong, King Yuen ; Chen, Kevin J.
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
287
Lastpage :
288
Abstract :
In conclusion, an AlGaN/GaN HEMT-compatible lateral field-effect rectifier is demonstrated by utilizing the threshold-voltage controlling capability of the fluorine plasma treatment technique. The rectifier features low on-resistance, low turn-on voltage, high temperature operation and high reverse breakdown voltage. The rectifier is expected to exhibit fast reverse recovery time because of its unipolar nature. In addition, the rectifiers are fabricated with the same process as the normally-off AlGaN/GaN HEMTs, indicating a robust low-cost approach of realizing GaN-based power integrated circuits.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; rectifiers; wide band gap semiconductors; AlGaN-GaN; HEMT-compatible lateral field-effect rectifier; fast reverse recovery time; fluorine plasma treatment; high electron mobility transistors; high reverse breakdown voltage; power integrated circuit; threshold-voltage controlling capability; Aluminum gallium nitride; Breakdown voltage; Gallium nitride; HEMTs; Low voltage; MODFETs; Plasma temperature; Power integrated circuits; Rectifiers; Robustness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800842
Filename :
4800842
Link To Document :
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