• DocumentCode
    2984836
  • Title

    Hot electron effects on undoped AlGaN/GaN high electron mobility transistors

  • Author

    Kim, H. ; Vertiatchikh, A. ; Tilak, V. ; Thompson, R.M. ; Prunty, T. ; Shealy, J.R. ; Eastman, L.F.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
  • fYear
    2002
  • fDate
    20 Oct. 2002
  • Firstpage
    5
  • Lastpage
    6
  • Abstract
    Summary form only given. In this work, we report on the effects of hot electron stress on the degradation of undoped Al0.3GaN0.7/GaN power HEMT´s with SiN passivation, consisting of a decrease in the drain current, an increase in the parasitic drain and source resistance, and a shift in threshold voltage. The stressed devices suffered from aggravated drain current slump (DC to RF dispersion). Pulsed I-V measurements and current-mode deep level transient spectroscopy (DLTS) suggested possible changes in surface charge profiles occurred during hot electron stress test. The nature of degradation under hot electron stress was irreversible.
  • Keywords
    III-V semiconductors; aluminium compounds; deep level transient spectroscopy; gallium compounds; hot carriers; passivation; power HEMT; semiconductor device reliability; wide band gap semiconductors; Al0.3GaN0.7-GaN; SiN passivation; current-mode DLTS; deep level transient spectroscopy; drain current; hot electron stress; parasitic drain resistance; parasitic source resistance; power HEMTs; pulsed I-V measurements; surface charge profiles; threshold voltage shift; undoped Al0.3GaN0.7/GaN HEMT; Aluminum gallium nitride; Degradation; Electron mobility; Gallium nitride; HEMTs; MODFETs; Passivation; Pulse measurements; Silicon compounds; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    GaAs Reliability Workshop, 2002
  • Print_ISBN
    0-7908-0103-5
  • Type

    conf

  • DOI
    10.1109/GAAS.2002.1167856
  • Filename
    1167856