DocumentCode
2984836
Title
Hot electron effects on undoped AlGaN/GaN high electron mobility transistors
Author
Kim, H. ; Vertiatchikh, A. ; Tilak, V. ; Thompson, R.M. ; Prunty, T. ; Shealy, J.R. ; Eastman, L.F.
Author_Institution
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
fYear
2002
fDate
20 Oct. 2002
Firstpage
5
Lastpage
6
Abstract
Summary form only given. In this work, we report on the effects of hot electron stress on the degradation of undoped Al0.3GaN0.7/GaN power HEMT´s with SiN passivation, consisting of a decrease in the drain current, an increase in the parasitic drain and source resistance, and a shift in threshold voltage. The stressed devices suffered from aggravated drain current slump (DC to RF dispersion). Pulsed I-V measurements and current-mode deep level transient spectroscopy (DLTS) suggested possible changes in surface charge profiles occurred during hot electron stress test. The nature of degradation under hot electron stress was irreversible.
Keywords
III-V semiconductors; aluminium compounds; deep level transient spectroscopy; gallium compounds; hot carriers; passivation; power HEMT; semiconductor device reliability; wide band gap semiconductors; Al0.3GaN0.7-GaN; SiN passivation; current-mode DLTS; deep level transient spectroscopy; drain current; hot electron stress; parasitic drain resistance; parasitic source resistance; power HEMTs; pulsed I-V measurements; surface charge profiles; threshold voltage shift; undoped Al0.3GaN0.7/GaN HEMT; Aluminum gallium nitride; Degradation; Electron mobility; Gallium nitride; HEMTs; MODFETs; Passivation; Pulse measurements; Silicon compounds; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
GaAs Reliability Workshop, 2002
Print_ISBN
0-7908-0103-5
Type
conf
DOI
10.1109/GAAS.2002.1167856
Filename
1167856
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