Title :
Hot electron effects on undoped AlGaN/GaN high electron mobility transistors
Author :
Kim, H. ; Vertiatchikh, A. ; Tilak, V. ; Thompson, R.M. ; Prunty, T. ; Shealy, J.R. ; Eastman, L.F.
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
Abstract :
Summary form only given. In this work, we report on the effects of hot electron stress on the degradation of undoped Al0.3GaN0.7/GaN power HEMT´s with SiN passivation, consisting of a decrease in the drain current, an increase in the parasitic drain and source resistance, and a shift in threshold voltage. The stressed devices suffered from aggravated drain current slump (DC to RF dispersion). Pulsed I-V measurements and current-mode deep level transient spectroscopy (DLTS) suggested possible changes in surface charge profiles occurred during hot electron stress test. The nature of degradation under hot electron stress was irreversible.
Keywords :
III-V semiconductors; aluminium compounds; deep level transient spectroscopy; gallium compounds; hot carriers; passivation; power HEMT; semiconductor device reliability; wide band gap semiconductors; Al0.3GaN0.7-GaN; SiN passivation; current-mode DLTS; deep level transient spectroscopy; drain current; hot electron stress; parasitic drain resistance; parasitic source resistance; power HEMTs; pulsed I-V measurements; surface charge profiles; threshold voltage shift; undoped Al0.3GaN0.7/GaN HEMT; Aluminum gallium nitride; Degradation; Electron mobility; Gallium nitride; HEMTs; MODFETs; Passivation; Pulse measurements; Silicon compounds; Stress;
Conference_Titel :
GaAs Reliability Workshop, 2002
Print_ISBN :
0-7908-0103-5
DOI :
10.1109/GAAS.2002.1167856