Title : 
Comparison of diffusion length measurements from the flying spot technique and the photocarrier grating method in amorphous thin films
         
        
            Author : 
Vieira, M. ; Fantoni, A. ; Martins, R. ; Chu, V. ; Koynov, S. ; Wang, F. ; Grebner, S. ; Schwarz, R.
         
        
            Author_Institution : 
FCT-UNL/UNINOVA, Monte da Caparica, Portugal
         
        
        
        
        
        
            Abstract : 
Using the Flying Spot Technique (FST) we have studied minority carrier transport parallel and perpendicular to the surface of amorphous silicon films (a-Si:H). To reduce slow transients due to charge redistribution in low resistivity regions during the measurement we have applied a strong homogeneously absorbed bias light. The defect density was estimated from CPM measurements. The steady-state photocarrier grating technique (SSPG) is a 1-dimensional approach. However, the modulation depth of the carrier profile is also dependent on film surface properties, like surface recombination velocity. Both methods yield comparable diffusion lengths when applied to a-Si:H
         
        
            Keywords : 
amorphous semiconductors; carrier lifetime; elemental semiconductors; hydrogen; minority carriers; photoconductivity; semiconductor thin films; silicon; surface recombination; Si:H; a-Si:H; amorphous thin films; carrier profile; charge redistribution; defect density; diffusion length measurements; diffusion lengths; film surface properties; flying spot technique; minority carrier transport; modulation depth; photocarrier grating method; semiconductor; strong homogeneously absorbed bias light; surface recombination velocity; Amorphous materials; Conductivity; Gratings; Length measurement; Lighting; PIN photodiodes; Photoconductivity; Poisson equations; Semiconductor thin films; Steady-state;
         
        
        
        
            Conference_Titel : 
Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on
         
        
            Conference_Location : 
Waikoloa, HI
         
        
            Print_ISBN : 
0-7803-1460-3
         
        
        
            DOI : 
10.1109/WCPEC.1994.520026