DocumentCode :
2986488
Title :
Plasma sources & sensors of near terahertz radiation
Author :
Rudd, J.V. ; Zutavern, F.J. ; Collins, R.T. ; Mcpherson, L.A. ; Nelson, T.R. ; Luk, T.S. ; Cameron, S.M.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Volume :
3
fYear :
2005
fDate :
22-27 May 2005
Firstpage :
1948
Abstract :
Terahertz radiation from optically-induced plasmas on metal, semiconductor, and dielectric surfaces is compared to electron-hole plasma radiation from GaAs and Ge. Electro-optic sampling and electric-field probes measure radiated field waveforms and distributions to 0.350 THz.
Keywords :
III-V semiconductors; electro-optical effects; elemental semiconductors; gallium arsenide; germanium; high-speed optical techniques; plasma light propagation; 0.350 THz; GaAs; Ge; electric-field probes; electro-optic sampling; electron-hole plasma radiation; near terahertz radiation; optically-induced plasmas; plasma sensors; plasma sources; Dielectrics; Gallium arsenide; Optical sensors; Optical surface waves; Plasma measurements; Plasma sources; Plasma waves; Probes; Sampling methods; Surface waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. (CLEO). Conference on
Print_ISBN :
1-55752-795-4
Type :
conf
DOI :
10.1109/CLEO.2005.202330
Filename :
1573396
Link To Document :
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