DocumentCode
2987015
Title
Incorporating PVT Variations in System-Level Power Exploration of On-Chip Communication Architectures
Author
Pasricha, Sudeep ; Park, Young-Hwan ; Kurdahi, Fadi J. ; Dutt, Nikil
Author_Institution
Univ. of California, Irvine
fYear
2008
fDate
4-8 Jan. 2008
Firstpage
363
Lastpage
370
Abstract
With the shift towards deep sub-micron (DSM) technologies, the increase in leakage power and the adoption of power-aware design methodologies have resulted in potentially significant variations in power consumption under different process, voltage and temperature (PVT) corners. In this paper, we first investigate the impact of PVT corners on power consumption at the System-on-Chip (SoC) level, especially for the on-chip communication infrastructure. Given a target technology library, we then show how it is possible to "scale up" and abstract the PVT variability at the system level, allowing characterization of the PVT-aware design space early in the design flow. We conducted several experiments to estimate power for PVT corner cases, at the gate-level, as well as at the higher system-level. Our preliminary results are very interesting and indicate that: (i) there are significant variations in power consumption across PVT corners, and (ii) the PVT-aware power estimation problem may be amenable to a reasonably simple abstraction at the system-level.
Keywords
integrated circuit design; low-power electronics; nanoelectronics; system buses; system-on-chip; PVT-aware power estimation problem; bus matrix; deep sub-micron technologies; leakage power; nanometer technologies; on-chip communication architectures; power consumption; power-aware design methodologies; process-voltage-temperature variation; system-level power exploration; system-on-chip level; Costs; Design methodology; Energy consumption; Libraries; Space technology; System-on-a-chip; Temperature; Time to market; Timing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Design, 2008. VLSID 2008. 21st International Conference on
Conference_Location
Hyderabad
ISSN
1063-9667
Print_ISBN
0-7695-3083-4
Type
conf
DOI
10.1109/VLSI.2008.14
Filename
4450528
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