DocumentCode :
2987106
Title :
3-D fabrication of microfluidic channels in fused silica using focused femtosecond laser beams
Author :
Hnatovsky, Cyril ; Taylor, Rod S. ; Bhardwaj, Ravi ; Simova, Eli ; Rayner, David M. ; Corkum, Paul B.
Author_Institution :
Phys. Dept., Ottawa Univ., Ont., Canada
Volume :
3
fYear :
2005
fDate :
22-27 May 2005
Firstpage :
2040
Abstract :
We demonstrate polarization dependence of the etch rate in femtosecond laser fabrication of 3-D microfluidic channels. We also show the existence of an energy threshold at which etching becomes highly selective.
Keywords :
etching; high-speed optical techniques; laser beams; laser materials processing; light polarisation; microfluidics; optical fabrication; optical focusing; silicon compounds; SiO2; etch rate; focused femtosecond laser beams; fused silica; microfluidic channel fabrication; polarization dependence; Chemical lasers; Etching; Laser beams; Lenses; Microfluidics; Optical device fabrication; Optical materials; Silicon compounds; Ultrafast optics; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. (CLEO). Conference on
Print_ISBN :
1-55752-795-4
Type :
conf
DOI :
10.1109/CLEO.2005.202361
Filename :
1573427
Link To Document :
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