Title :
Research and development on UV-LIGA at HUST
Author :
Zhimou Xu ; He, Shaowei ; Li, Xong ; Wang, Shangbao ; Yi, Xinjian ; Lian, Kun ; Liu, Sheng
Author_Institution :
Inst. of Microsystems, Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
UV-LIGA utilizes, instead of the X-ray an ultraviolet source to expose the resists. Such a source can be provided by mercury lamps. The mask involved is a simple chromium mask. These factors are decisive in making the UV-LIGA much cheaper than the LIGA fabrication. UV-LIGA fills the gap existing in fabrication technologies between the methods of classical mechanics and the technologies of microelectronics, offering completely new design and construction possibilities for sensors, actuators and microsystems, such as microfluidic systems. In addition, UV-LIGA technology has been extensively applied in the fields of Microelectromechanical System (MEMS). UV-LIGA technology has been studied for several years at Huazhong University of Science and Technology (HUST). In particular, the important development of UV-LIGA was obtained in the past two years. In this paper, the research and development on UV-LIGA technology at HUST will be described.
Keywords :
LIGA; micromechanical devices; photoresists; ultraviolet lithography; 3D microstructures; MEMS; SU-8 resist; UV-LIGA; absorption coefficient; chromium mask; high aspect ratio; high viscosity resist; mercury lamps; near UV radiation sensitivity; Actuators; Chromium; Fabrication; Lamps; Microelectronics; Microfluidics; Research and development; Resists; Sensor systems; Ultraviolet sources;
Conference_Titel :
Electronic Packaging Technology Proceedings, 2003. ICEPT 2003. Fifth International Conference on
Conference_Location :
Shanghai, China
Print_ISBN :
0-7803-8168-8
DOI :
10.1109/EPTC.2003.1298723
