Research and development on UV-LIGA at HUST

Author

Zhimou Xu ; He, Shaowei ; Li, Xong ; Wang, Shangbao ; Yi, Xinjian ; Lian, Kun ; Liu, Sheng

Author_Institution

Inst. of Microsystems, Huazhong Univ. of Sci. & Technol., Wuhan, China

fYear

2003

fDate

28-30 Oct. 2003

Firstpage

190

Lastpage

194

Abstract

UV-LIGA utilizes, instead of the X-ray an ultraviolet source to expose the resists. Such a source can be provided by mercury lamps. The mask involved is a simple chromium mask. These factors are decisive in making the UV-LIGA much cheaper than the LIGA fabrication. UV-LIGA fills the gap existing in fabrication technologies between the methods of classical mechanics and the technologies of microelectronics, offering completely new design and construction possibilities for sensors, actuators and microsystems, such as microfluidic systems. In addition, UV-LIGA technology has been extensively applied in the fields of Microelectromechanical System (MEMS). UV-LIGA technology has been studied for several years at Huazhong University of Science and Technology (HUST). In particular, the important development of UV-LIGA was obtained in the past two years. In this paper, the research and development on UV-LIGA technology at HUST will be described.

Keywords

LIGA; micromechanical devices; photoresists; ultraviolet lithography; 3D microstructures; MEMS; SU-8 resist; UV-LIGA; absorption coefficient; chromium mask; high aspect ratio; high viscosity resist; mercury lamps; near UV radiation sensitivity; Actuators; Chromium; Fabrication; Lamps; Microelectronics; Microfluidics; Research and development; Resists; Sensor systems; Ultraviolet sources;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronic Packaging Technology Proceedings, 2003. ICEPT 2003. Fifth International Conference on

Conference_Location

Shanghai, China

Print_ISBN

0-7803-8168-8

Type

conf

DOI

10.1109/EPTC.2003.1298723

Filename

1298723