DocumentCode
298981
Title
CVD dynamics for real-time control: multi-component and flow modelling
Author
Gevelber, M.A. ; Quiñones, M.T. ; Bufano, M.L. ; Deniz, M.C. ; Stubbs, A. ; Weeks, J. ; Grunke, K.
Author_Institution
Dept. of Manuf. Eng., Boston Univ., MA, USA
Volume
2
fYear
1995
fDate
21-23 Jun 1995
Firstpage
1220
Abstract
An expanded nonlinear dynamic model of chemical vapor deposition (CVD) is presented and analysed to obtain insight into the design of an appropriate control structure
Keywords
batch processing (industrial); chemical vapour deposition; closed loop systems; flow; poles and zeros; process control; real-time systems; chemical vapor deposition; control structure; expanded nonlinear dynamic model; flow modelling; multi-component modelling; real-time control; Chemical vapor deposition; Coatings; Delay effects; Fluid dynamics; Heat transfer; Inductors; Physics; Pressure control; Virtual manufacturing; Weight control;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, Proceedings of the 1995
Conference_Location
Seattle, WA
Print_ISBN
0-7803-2445-5
Type
conf
DOI
10.1109/ACC.1995.520944
Filename
520944
Link To Document