DocumentCode
2990514
Title
2D Silicon-based Photonic Crystals
Author
Sin, Y.K. ; Ibrahim, K.
Author_Institution
Univ. Sains Malaysia, Pinang
fYear
2006
fDate
Oct. 29 2006-Dec. 1 2006
Firstpage
236
Lastpage
239
Abstract
In the present paper, fabrication of a silicon-based two-dimensional photonic crystal based on electron beam lithography (EBL) and reactive ion etching (RIE) was demonstrated. In addition the structural color of fabricated crystal was obtained with a simple experimental setup consisted of a light source and a digital camera. From the result, the structural color of PhCs was underlying on the concept of reflection grating.
Keywords
diffraction gratings; electron beam lithography; elemental semiconductors; etching; optical fabrication; photonic crystals; reflectivity; silicon; Si; digital camera; electron beam lithography; light source; reactive ion etching; reflection grating; silicon-based two-dimensional photonic crystal; structural color; Crystalline materials; Digital cameras; Fabrication; Light sources; Optical reflection; Photonic band gap; Photonic crystals; Photonic integrated circuits; Semiconductor materials; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location
Kuala Lumpur
Print_ISBN
0-7803-9730-4
Electronic_ISBN
0-7803-9731-2
Type
conf
DOI
10.1109/SMELEC.2006.381055
Filename
4266605
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