Title :
Studies on MgxZn1-xO thin film resonator for mass sensor application
Author :
Chen, Ying ; Saraf, Gaurav ; Wittstruck, Richard H. ; Emanetoglu, Nuri W. ; Lu, Yicheng
Author_Institution :
Dept. of Electr. & Comput. Eng., New Jersey State Univ., Piscataway, NJ
Abstract :
Zinc oxide (ZnO) and its ternary alloy magnesium zinc oxide (Mg xZn1-xO) are piezoelectric materials for high quality factor bulk acoustic wave (BAW) resonators operating at GHz frequencies. MgxZn1-xO thin film BAW devices built on Si substrates are particularly attractive for integrating piezoelectric MgxZn1-xO with the main stream semiconductor devices and circuits. In this paper, we report single-mode MgxZn1-xO based thin film resonators (TFRs) built on Si substrates. An acoustic mirror, composed of alternating quarter-wavelength silicon dioxide (SiO2) and tungsten (W) layers, is used to isolate the resonator from the Si substrate. High quality and well c-axis oriented MgxZn1-xO thin films are deposited on Si substrates using RF sputtering technology. X-ray diffraction (XRD) and field emission electron microscopy (FESEM) are used to characterize the MgxZn1-xO layers. The theoretical analysis of the TFR, based on the transmission line model, is presented. The BAW velocity and effective coupling coefficient of Mg xZn1-xO can be tailored by varying the Mg composition in the films. The acoustic velocity increases with increasing Mg composition. The feasibility to use this structure to build ultra-high-sensitive mass BAW TFR sensor is analyzed. A mass sensitivity higher than 103 Hz cm2/ng is demonstrated
Keywords :
bulk acoustic wave devices; crystal resonators; magnesium compounds; mass measurement; piezoelectric materials; sensors; silicon compounds; thin film devices; tungsten; zinc compounds; MgxZn1-xO thin film resonator; MgZnO; RF sputtering technology; SiO2; X-ray diffraction; acoustic mirror; acoustic velocity; bulk acoustic wave resonators; field emission electron microscopy; mass sensor; piezoelectric materials; quality factor; semiconductor devices; silicon dioxide layer; ternary alloy; transmission line model; tungsten layer; zinc oxide; Acoustic waves; Magnesium; Piezoelectric films; Piezoelectric materials; Q factor; Semiconductor thin films; Sputtering; Substrates; Thin film circuits; Zinc oxide;
Conference_Titel :
Frequency Control Symposium and Exposition, 2005. Proceedings of the 2005 IEEE International
Conference_Location :
Vancouver, BC
Print_ISBN :
0-7803-9053-9
DOI :
10.1109/FREQ.2005.1573916