• DocumentCode
    2992246
  • Title

    Plane-view Transmission Electron Microscopy for Advanced Integrated Circuit

  • Author

    Liu, Pan ; Li, K. ; Eddie, E.R. ; Zhao, Siping

  • Author_Institution
    Chartered Semicond. Manuf. Ltd., Singapore
  • fYear
    2006
  • fDate
    Oct. 29 2006-Dec. 1 2006
  • Firstpage
    630
  • Lastpage
    633
  • Abstract
    In this paper, the authors try to introduce three techniques for plane-view TEM sample preparation. First, traditional plane-view TEM sample preparation will be introduced. The second technique is FIB- based lift-out method, which places the sample on the carbon film. This technique is used to cut isolated defects, such as SRAM single bit failure, but this technique introduces artifacts from FIB ion damage and carbon film. The last technique is a combination of tripod polishing, FIB milling and ion milling. Specific cases will be given to illustrate the application of these techniques.
  • Keywords
    integrated circuits; polishing; transmission electron microscopy; FIB milling; SRAM single bit failure; advanced integrated circuit; ion milling; plane-view transmission electron microscopy; tripod polishing; Amorphous materials; Circuits; Condition monitoring; Dielectric substrates; Erbium; Milling; Process control; Random access memory; Transmission electron microscopy; Wood industry;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    0-7803-9730-4
  • Electronic_ISBN
    0-7803-9731-2
  • Type

    conf

  • DOI
    10.1109/SMELEC.2006.380709
  • Filename
    4266692