Title :
Application of Focus Ion Beam Circuit Edit in Failure Analysis
Author :
Loh, S.K. ; Teo, H.T. ; Neo, S.P. ; Song, Z.G. ; Oh, C.K.
Author_Institution :
Chartered Semicond. Mfg Ltd., Singapore
fDate :
Oct. 29 2006-Dec. 1 2006
Abstract :
Focus ion beam is an indispensable tool in failure analysis laboratory. It has a wide range of applications. This paper will discuss its application in circuit edit to enhance failure analysis on two failure modes by isolating the defective sites of the failures and finally identifying the root causes.
Keywords :
circuit reliability; failure analysis; focused ion beam technology; network analysis; defective site isolation; failure analysis laboratory; focus ion beam circuit edit; Circuits; Failure analysis; Ion beams; Laboratories; MIM capacitors; Random access memory; Silicidation; Voltage; Wires; Wood industry;
Conference_Titel :
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
0-7803-9730-4
Electronic_ISBN :
0-7803-9731-2
DOI :
10.1109/SMELEC.2006.380710
