Title :
Kerr nonlinearity in silicon beyond 2.35μm
Author :
Zlatanovic, S. ; Gholami, F. ; Simic, A. ; Liu, L. ; Alic, N. ; Nezhad, M. ; Fainman, Y. ; Radic, S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California San Diego, La Jolla, CA, USA
Abstract :
We present measurements of χ(3) in silicon in the 2.35 to 2.75μm interval, showing Kerr coefficients close to 1×10-18 m2/W. The results clearly identify silicon as a promising platform for nonlinear processes in the mid-infrared.
Keywords :
elemental semiconductors; nonlinear optics; optical Kerr effect; silicon; Kerr coefficients; Kerr nonlinearity; Si; nonlinear processes; wavelength 2.35 mum to 2.75 mum; Absorption; Apertures; Laser beams; Measurement by laser beam; Optical filters; Silicon; Wavelength measurement;
Conference_Titel :
Photonics Society Summer Topical Meeting Series, 2011 IEEE
Conference_Location :
Montreal, QC
Print_ISBN :
978-1-4244-5730-4
DOI :
10.1109/PHOSST.2011.6000043