DocumentCode :
2992888
Title :
Meeting the Challenges of Elemental Analysis in 90nm & Beyond Technologies - Case Studies of Scanning Auger Nanoprobe
Author :
Rao, Nistala Ramesh ; Wang, Tan Chin ; Zhigang, Song ; Younan, Hua ; Siping, Zhao
Author_Institution :
Chartered Semicondcutor Manuf. Ltd., Singapore
fYear :
2006
fDate :
Oct. 29 2006-Dec. 1 2006
Firstpage :
768
Lastpage :
772
Abstract :
This paper few case studies of Auger elemental analysis in failure analysis of wafer fabrication, using a state-of-the-art scanning Auger nanoprobe, will be presented. Material identification in particle defects is quite challenging especially in advanced microelectronic technologies, 90nm and beyond, where, due to decreasing device size, the tight pitch and high aspect ratio of features introduces constraints of analysis. Thus, the case studies discussed in the paper are all pertaining to the front-end related defects, at poly+contact region of the die, where these contraints are expected to be severe. It will be shown that the scanning Auger nanoprobe can be used for the elemental analysis of features as small as ~10nm.
Keywords :
failure analysis; nanotechnology; probes; Auger elemental analysis; failure analysis; microelectronic technology; nanotechnology; scanning Auger nanoprobe; size 90 nm; wafer fabrication; Electron beams; Fabrication; Failure analysis; Microelectronics; Performance analysis; Probes; Spectroscopy; Textile industry; Voltage; Wood industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
0-7803-9730-4
Electronic_ISBN :
0-7803-9731-2
Type :
conf
DOI :
10.1109/SMELEC.2006.380740
Filename :
4266723
Link To Document :
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