• DocumentCode
    2993075
  • Title

    A Study on Minority Carrier Diffusion Length of Semiconductor with Constant Measure of Surface Photovoltage

  • Author

    He, Xuan ; Chen, Changying ; Deng, Wei ; Zhang, Hao

  • Author_Institution
    Educ. Dept. of Guangdong Province, Jinan Univ., Guangzhou, China
  • fYear
    2012
  • fDate
    21-23 May 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    To evaluate the quality of silicon, based on the integrity of materials, a system using surface photovoltage to measure the minority carrier diffusion length of semiconductor. The system can be used to obtain the surface photovoltage by the method of chopper, monochromator and Lock-in amplifier. We get the minority carrier diffusion length of semiconductor by the use of the relationship between the surface photovoltage and the optical absorption coefficient of materials. The measuring principle of the system and the realizing methods for all models are explained in detail. The results showed that a constant measure of surface photovoltage method for measuring the semiconductor minority carrier diffusion length to achieve the intended results.
  • Keywords
    absorption coefficients; carrier lifetime; elemental semiconductors; minority carriers; silicon; surface photovoltage; Si; chopper method; lock-in amplifier; monochromator; optical absorption coefficient; semiconductor minority carrier diffusion length; surface photovoltage; Charge carrier lifetime; Frequency measurement; Length measurement; Optical surface waves; Pollution measurement; Semiconductor device measurement; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronics (SOPO), 2012 Symposium on
  • Conference_Location
    Shanghai
  • ISSN
    2156-8464
  • Print_ISBN
    978-1-4577-0909-8
  • Type

    conf

  • DOI
    10.1109/SOPO.2012.6270463
  • Filename
    6270463