Title :
High-performance AlGaAs/InGaAs/GaAs PHEMTs for K and Ka-band applications
Author :
Kiziloglu, K. ; Ming Hu ; Harvey, D.S. ; Widman, R.D. ; Hooper, C.E. ; Janke, P.B. ; Brown, J.J. ; Nguyen, L.D. ; Docter, D.P. ; Burkhart, S.R.
Author_Institution :
HRL Labs., Malibu, CA, USA
Abstract :
We report AlGaAs/InGaAs/GaAs PHEMTs with high efficiency and power output, suitable for use in K and Ka-band applications. On-wafer active load-pull measurements were performed at 20 GHz on double-recessed devices with a gatelength (L/sub g/) of 0.14 /spl mu/m. P/sub out/=26.7 dBm was obtained from a 640 /spl mu/m part with power added efficiency (PAE) of 52% and associated power gain (G/sub A/) of 9.7 dB. This implies a power density of 727 mW/mm for this technology. When tuned for a maximum PAE of 54.9%, another 640 /spl mu/m device yielded P/sub out/=25.2 dBm and G/sub A/=10.4 dB. A maximum P/sub out/ of 27.4 dBm was also obtained from an 800 /spl mu/m part. This same transistor consistently yielded a PAE greater than 50% for an entire drain-source bias (V/sub DS/) range of 2-8 V. We believe these devices present the best combination of P/sub out/, PAE and G/sub A/ reported thus far in the literature for PHEMTs at 20 GHz.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; microwave field effect transistors; microwave measurement; microwave power transistors; power HEMT; semiconductor device measurement; 0.14 micron; 10.4 dB; 2 to 8 V; 20 GHz; 52 percent; 54.9 percent; 640 micron; 800 micron; 9.7 dB; AlGaAs-InGaAs-GaAs; III-V semiconductors; K-band; Ka-band; PHEMTs; double-recessed devices; drain-source bias; on-wafer active load-pull measurements; power added efficiency; power density; power gain; power output; Fabrication; Gallium arsenide; Gold; Indium gallium arsenide; Laboratories; Ohmic contacts; Optical amplifiers; Optical buffering; PHEMTs; Thermal resistance;
Conference_Titel :
Microwave Symposium Digest, 1999 IEEE MTT-S International
Conference_Location :
Anaheim, CA, USA
Print_ISBN :
0-7803-5135-5
DOI :
10.1109/MWSYM.1999.779852